Ultra High Purity Sodium Hypochlorite

Sodium hypochlorite (UHP grade) is a highly effective disinfectant used in advanced water purification systems where consistency and purity are critical.

In water treatment, sodium hypochlorite releases free chlorine, which destroys bacteria, viruses, and other harmful microorganisms. This makes it essential for ensuring microbiological safety in drinking water, process water, and high-purity industrial water systems.

In ultra-pure water (UPW) systems—such as those used in semiconductors, solar, and electronics—UHP NaOCl is preferred because it introduces minimal impurities while providing strong and reliable disinfection. It is commonly used for:

  • Sanitization of storage tanks and pipelines

  • Control of biofilm formation in RO and ion exchange systems

  • Periodic shock dosing to maintain sterile conditions

Ultra High Purity HCL

Hydrochloric acid (UHP grade) is used in advanced water purification for precise pH control, system cleaning, and removal of trace contaminants, ensuring consistent ultra-pure water (UPW) quality.

Its ultra-high purity minimizes the introduction of metal ions and impurities, making it ideal for sensitive applications in semiconductor and electronics manufacturing.

We supply UHP HCl to the semiconductor industry, where it is critical for wafer cleaning, surface preparation, and metal removal, supporting high-yield, defect-free production.

PPB Levels Nitric Acid

Nitric acid (electronic grade) is a critical oxidizing acid used in advanced semiconductor manufacturing where extreme cleanliness and precision are required.

It is primarily used for removal of metallic contaminants from wafer surfaces. Its strong oxidizing nature converts trace metals into soluble forms, enabling effective cleaning without damaging the underlying structures. It is also used in surface conditioning and preparation steps, ensuring wafers are free from residues before subsequent processing.

In combination with other ultra-high purity chemicals, nitric acid forms part of multi-step cleaning sequences, helping achieve the ultra-clean surfaces required for high-performance devices.Nitric acid (high-purity / electronic grade) is a critical oxidizing acid used in advanced semiconductor manufacturing where extreme cleanliness and precision are required.